Spin Coater with Temperature Control SCTC-200 - up to 200 C
This price is only available upon request. Contact us for a quote or fill the request form at the bottom of this page.
Introduction
The SCTC-200 Spin Coater is a high-performance laboratory spin coater with integrated temperature control up to 200 °C. It features a robust mechanical design and a precise motion control system, ensuring consistent and reliable operation. The system is equipped with an advanced temperature control unit, allowing spin coating under stable and uniform thermal conditions.
The SCTC-200 supports programmable rotation in both clockwise and counterclockwise directions. After the spin coating process, the unit can also function as a standard hot plate for photolithography baking applications.
The SCTC-200 offers two mounting configurations to balance precision with versatility:
Vacuum Chuck: Optimized mainly for 4-inch or 6-inch round wafers. The specially engineered vacuum chuck use suction to hold the substrate flat, simplifying substrate loading and unloading and ensuring maximum surface uniformity for standard semiconductor tasks.
Clamp Style: Modeled after the SCTC-150, this mechanical system accommodates various shapes and dimensions. It is the ideal choice for irregular substrates or non-standard materials that cannot be secured by a vacuum.
The operating program can store 10 recipes, each recipe includes up to 10 steps. Operating parameters such as temperature, rotating speed, rotating time can be monitored in real time.
For customization of the main unit and vacuum chucks for your applications, please contact us.
For higher heating temperature and other customization, please contact us at 1-888-229-1281 or email info@micronanotools.com for more details.
The SCTC-200 uses vacuum chucks instead of the sample clamps used in the SCTC-150, but the touchscreen operation remains similar.
Features
- Offers two mounting configurations to balance precision with versatility, Vacuum chuck and clamp chuck
- High precision temperature control, up to 200 Celsius degree
- Rotate in both clockwise and counter clockwise direction
- Work as a standalone photolithography hot plate
- Special spindle design to minimize PR leakage
- Programmable multi-step spin coating process
- Chemical resistant HDPE spin bowl
- Chemical resistant transparent spin lid
Specifications
|
Model |
SCTC-200 |
|
Maximum rotational speed |
8000 RPM |
|
Speed resolution |
1 RPM |
|
Maximum rotation time |
3,000 S |
|
Rotation time resolution |
0. 1 S |
|
Acceleration range |
100-5000 RPM/S |
|
Temperature control range |
Room temperature ~ 200 C |
|
Effective heating area |
Diameter 50mm |
|
Chuck for sample Dia. or lateral ≥ 10mm |
Vacuum chuck, one included for 4 inch or 6 inch wafer |
|
Dimensions |
264mm (W) x 410mm (D) x 280mm (H) |
|
Weight |
18Kg |
|
Power input |
100- 120V, single phase, 550W ( 110V type) 200-230V, single phase, 550W (220V type) |
|
Fuse |
Circuit breaker |
|
Note: Temperature inside the vacuum chamber may drop when chuck starts to rotate because rotation of the chuck will bring turbulent air flow inside the spinning chamber. The temperature drop may be compensated for setting the heating temperature a few degrees higher than that required. |
|
Warranty
- One years standard warranty for both parts and services with life-time support
Additional Notes
- Lead time of the item is 20 business days
- All university clients from US and Canada are entitled to payment term of net 30 days automatically. No worry, No stress, No Risk.
- Seller from Canada, on site local services available upon request
- Free shipping for US and Canada, duty, and custom clearance all included in the price when applicable
- Accept custom OEM if there are any special requirements for your application
